In the industry, Vapor Phase Decomposition Inductively Coupled Mass Spectroscopy is abbreviated to VPD-ICPMS. If you've been wanting to learn a little more about it, Cerium Labs is happy to help!
It all starts with the vapor phase decomposition sample preparation technique. During this process, trace elements on the surface of a silicon wafer are collected into a liquid sample to be analyzed by HR-ICP-MS. The silicon wafer, which can be 150, 200, or 300 mm, is exposed to hydrofluoric acid vapor in a sealed chilling chamber.
After this step, the condensate is collected by rolling a drop of scan solution across the surface of the wafer. The scan solution is almost always a dilute mixture of hydrogen peroxide, nitric acid, and hydrofluoric acid. The drop is transferred from the wafer surface into a clean sample vial.
Lastly, the liquid sample is analyzed for trace metals using HR-ICP-MS. The VPD technique is capable of measuring metallic contaminants at concentrations ranging from 1E6 to 1E14 atoms/cm2. It is particularly useful in measuring light elements on bare silicon or in hydrofluoric acid soluble thin films.
Cerium Labs has the instruments, knowledge, and industry experts to do this job the right way. Reach out to us today to learn more.