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Insights, techniques, and news on analytical chemistry, materials characterization, and semiconductor testing.

June 10, 2026

The Impending Phase-Out of Trichloroethylene (TCE): Why Residual Testing Matters

As TCE is phased out under new regulation, manufacturers need residual testing to verify processes, equipment, and supply chains are free of contamination. The post explains how GC-MS and FT-IR support that transition.

Solving Molecular Imperfections in Semiconductor Materials and Processes using FTIR

FTIR analysis helps semiconductor companies identify molecular-level imperfections, optimize processes, characterize materials, and support sustainability goals.

Advanced TD-GC-MS Technique to Identify and Control Organic Contamination

GC-MS and ATD-GC-MS help semiconductor manufacturers identify and control organic contamination at very low levels. The post explains applications for materials, process chemicals, and yield management.

Our Commitment to Client Relationships

Cerium emphasizes collaborative client relationships rather than simply running tests and sending reports. The post highlights work with Dr. Judy Runge and TEM-based anodizing research.

Celebrating 30 Years at Cerium Laboratories

Cerium celebrates 30 years of analytical services, from its AMD roots to its independent work supporting semiconductor and advanced materials customers.

Cerium’s Team is part of your team!

Cerium’s scientists work collaboratively with clients to solve problems, verify materials, and interpret analytical results. The post shares examples from failure analysis, metallurgy, and quality control.

The History of Cerium Laboratories

Cerium Laboratories grew from an AMD support lab into an independent ISO 17025 accredited analytical services company. The post traces its history, customers, and future plans.

Learn More About TEM

Transmission Electron Microscopy lets scientists study nano-sized structures that are too small for light microscopes. The post introduces TEM fundamentals and Cerium’s applications.

6 Steps to Ensure Valid Metals Analysis

Valid trace metals analysis depends on careful wafer handling before samples reach the lab. The post lists six practical steps to reduce cross-contamination.

VPD-ICPMS vs TXRF

VPD-ICPMS and TXRF both measure trace wafer contamination, but they differ in sensitivity, spatial information, destructiveness, and materials compatibility.

Frequently Asked Questions Regarding Vapor Phase Decomposition Inductively Coupled Mass Spectroscopy

This FAQ explains what VPD-ICPMS is, how wafers are prepared, what elements can be measured, and what instrument Cerium uses.

Understanding Vapor Phase Decomposition Inductively Coupled Mass Spectroscopy

VPD-ICPMS collects trace elements from silicon wafer surfaces and analyzes them with high-resolution ICP-MS. The post describes the preparation, collection, and analysis workflow.

What’s in the water – analytical chemistry helps everyone

ICPMS can measure dangerous metals such as lead in water and other materials at extremely low concentrations. The post explains why analytical chemistry matters for everyday health and safety.

Necessity of Using VPD-ICPMS Technique in Semiconductor manufacturing

VPD-ICPMS helps semiconductor manufacturers detect trace metal contamination on silicon wafers. The post walks through vapor phase decomposition, scanning solution collection, and ICP-MS analysis.

What is Gas Chromatography-Mass Spectrometry (GC-MS)?

Gas chromatography-mass spectrometry separates, identifies, and quantifies volatile and semi-volatile organic molecules. The post explains how GC-MS works and why it is useful for contamination analysis.

The benefits you get from chemical analysis of materials

Chemical analysis identifies major, minor, and trace components in materials so manufacturers can verify quality and avoid costly failures. The post outlines key benefits and common lab techniques.