PIXE
Particle Induced X-Ray Emission
Ion Beam Analysis
Particle Induced X-Ray Emission (PIXE) uses a high-energy (MeV) ion beam to bombard the sample surface. X-ray emissions provide chemical information about the elements present in the sample. PIXE measures trace impurities in bulk materials or thin-films deposited on substrates like silicon or bulk crystalline materials. These measurements are non-destructive, and standard-less.
At a glance
- Category
- Ion Beam Analysis
- Sample types
- Thin films, wafers, bulk solids
- Detection limits
- Provided with quote
- Turnaround
- Standard; expedited available
- Accreditation
- ISO 17025 — scope dependent
Representative specifications. Exact detection limits and turnaround are confirmed with your quote.